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Beilstein J. Nanotechnol. 2023, 14, 951–963, doi:10.3762/bjnano.14.78
Figure 1: Schematic sketch of the scia Atol 200 processing tool.
Figure 2: Schematic sketch of the structure of the precursor [Co2(CO)6HC≡CC5H11].
Figure 3: Influence of deposition temperature on film growth rate of continuous CVD depositions. The film gro...
Figure 4: Temperature dependence of inhibition time (red dots) and CVD growth rate (blue diamonds) extracted ...
Figure 5: XPS measurements of the CVD film deposited at 150 °C.
Figure 6: Growth per cycle of ALD processes with [Co2(CO)6HC≡CC5H11] precursor at various temperatures.
Figure 7: Film thickness evolution measured by in line spectroscopic ellipsometry for a deposition process at...
Figure 8: Influence of precursor pulse time on growth rate for depositions at 85 and 90 °C including a satura...
Figure 9: Influence of purging time after the precursor pulse (purging time 1) and after the H2 plasma pulse ...
Figure 10: Influence of the H2 plasma pulse length on film thickness with the corresponding thickness distribu...
Figure 11: Thickness distribution of cobalt film on a 200 mm wafer after 1500 cycles at 85 °C with 2 s H2 plas...
Figure 12: Thickness distribution of cobalt film on a 200 mm wafer after 1500 cycles at 85 °C with 4 s H2 plas...
Figure 13: XPS results of a cobalt film deposited at 35 °C by ALD with [Co2(CO)6HC≡CC5H11] precursor.
Figure 14: XPS measurements of a cobalt film deposited at 85 °C by ALD with [Co2(CO)6HC≡CC5H11] precursor.
Beilstein J. Nanotechnol. 2020, 11, 1439–1449, doi:10.3762/bjnano.11.128
Figure 1: Fabricated noble metal particles. (a–e): SEM images of wafer surface; (f–j): particle size distribu...
Figure 2: SEM surface images after 90 cycles of Ir ALD. The inset shows the corresponding cross section.
Figure 3: Microscope image of etched structures.
Figure 4: SEM images of etched structures (with 50 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Au particl...
Figure 5: SEM images of etched structures (with 145 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Au partic...
Figure 6: Measured reflectance of Au wafers after 10 min of etching in HF (1.73 mol/L)/H2O2 solution.
Figure 7: SEM images of etched structures (with 50 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Pd particl...
Figure 8: SEM images of etched structures using Cu particles, etched for 10 min with 1.73 mol/L HF and 10 mmo...
Figure 9: SEM images of etched structures (with 100 mmol/L H2O2 and 1.73 mol/L HF for 10 min) using Ir partic...
Figure 10: Reflectance of fabricated 3D templates, etched with 50 mmol/L H2O2 and 1.73 mol/L HF for 10 min. Ad...